Design capabilities using state-of-the-art analysis software
Laser marking
Chroma can minimize unwanted spectral characteristics with high quality substrates:
- <=5arc sec substrate wedge
- Lambda/10 flatness, RWD and TWD
- Sputtered coatings have minimal to no scatter
- Zero pixel shift from filter to filter for imaging
Available filter types:
- BP/LP/SP
- Multiband
- Notch
- Dichroic and polychroic mirrors
- ND/Ag-Al mirrors
- UV/VIS/N-IR
- AR coatings
- Hot/cold mirrors
- Additional filter types available.
Multiple coating methods:
- Modified Magnetron sputter deposition
- E-Beam Ion-Assist
- E-Beam
- Resistive-Source
Coatings and assemblies consistently meet:
- MIL-PRF-13830B
- MIL-PRF-48497
- ISO-9022, -02, 21 days
- MIL-C-675C
Chroma Technology uses a wide range of physical vapor deposition (PVD) processes »
Astronomy Capabiltiies