A Worked Example: Split-Field Order-Blocking Filters for Hyperspectral Imaging
The value of this capability became clear on a project involving a hyperspectral camera manufacturer. Their instruments use a line-scan imaging architecture, in which lenses, a slit, and dispersive elements (gratings and prisms) separate incoming light by wavelength across a detector array. A critical requirement in such systems is blocking higher diffraction orders, light at wavelengths that would alias into the measurement band, using order-blocking filters, or OBFs.
The OBF for this application needed to do something unusual: split the field of view into two. One half of the detector required a longpass coating, transmitting wavelengths from 1700 to 2400 nm while blocking shorter wavelengths. The other half required only an antireflection coating, passing wavelengths from 1000 to 1300 nm. The filter substrate was round with a chord cut — a flat edge — and the transition line between the two coating zones had to fall within 100 microns of its nominal position, with the flat-to-center dimension held to ±25 microns.
The transition zone width itself had to be under 200 microns. To put that in context: a standard pocket jig in good condition might produce a shadow zone of 500 microns. The material masking process Chroma previously used produced shadow zones of approximately 250 microns.
The process Chroma developed for this project ran in sequence: coat a plate with an antireflection coating on both sides, cut and chamfer the parts on the CNC Machine tools, measure 100% of parts for dimensional conformance, seat each part into the precision jig insert, apply the longpass coating to the unmasked region, and measure transition line placement and zone width. The result was a transition zone well within 200 microns.